technologies available for licensing

Rensselaer Polytechnic Institute has a variety of technologies ranging from chemicals to lighting systems to algorithms and everything in-between. Rensselaer’s technologies can help you start a company or be a great addition to your current technology portfolio. To see what technologies are currently available for licensing at Rensselaer, please use the search below. If you have a technology need that Rensselaer’s technologies don’t currently solve, please reach out to IPO to discuss more your needs.

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This invention is directed to a method to improve the performance of stepper motor driven systems.Stepper motors are ubiquitous in modern office equipment and other machinery, yet little is published regarding their optimal use in open loop systems.Accurate control of a stepper motor is limited by the ability of the control system to approximate the actual motor and…
Conventional technologies used for the generation of solar power include building-integrated flat-plate photovoltaic (PV) systems, and stand-alone concentrating PV systems that are removed from the location of power application. Although these technologies work, widespread adoption of them for general use has been hampered by a number of impediments, such as the large amount…
There is an increasing interest in using nanoparticles as building blocks for well-defined structures that have practical applications owing to the various novel properties of nanoparticles. However, their assembly is a challenging task. Methods based on surface functionalization, andor template patterning have been used for this purpose, but both of these processes can be…
This invention is directed to a highly accurate and efficient method and algorithm, namely the Dual-Bootstrap Iterative Closest Point algorithm, for performing image registration generally and retinal image registration in particular. Retinal image registration is challenging. The images are projections of a curved surface taken from a wide range of viewpoints using an un-…
Carbon nanotubes are a nanostructured material that promises to have a wide range of applications. However, the present techniques used to build nanotube architectures have several deficiencies, such as the inability to precisely and controllably align the nanotubes. This invention is a novel and powerful method to assemble carbon nanotubes on planar substrates to build and…
This invention is directed to a novel non-destructive method to remove excess layers of copper from microchip interconnect-metallization processing, allowing copper to be used in place of aluminum. The new method, an Electro-Chemical Planarization process, is a means of removing the copper in an electrolysis-designed solution bath without damaging the thin-film and…
Lookback is defined as the ability of a logical process to change its past locally (i.e. without involving other logical processes). Logical processes with lookback are able to process out-of-timestamp order events, enabling new synchronization protocols for the parallel discrete event simulation. This technology is directed to two of such protocols, LookBack-Global Virtual…
Double Dutch jump roping is a fun activity that requires skill. The activity is mainly played for recreation and for competitions. Industry has neglected to see the vast number of benefits in this activity, such as enhanced cardiovascular system, improved coordination and agility, and it is generally a very entertaining activity. The main limitation in the sport is that much…
This invention is directed to a method and architecture for efficiently solving complex problems requiring information retrieval from multiple, logically interrelated, distributed databases. The method is well suited for use in the manufacturing Virtual Design Environment. The method uses coevolutionary agents incorporating evolutionary algorithms located at different nodes in…
For most types of gelatin-based imaging elements, surface abrasion and scratching results in reduction of image quality. Thus, processing the image and, later, casual handling of the image can easily mark or disfigure the image. There is, therefore, a need for an imaging element having improved scratch resistance over materials currently used. It has been unexpectedly…