technologies available for licensing

Rensselaer Polytechnic Institute has a variety of technologies ranging from chemicals to lighting systems to algorithms and everything in-between. Rensselaer’s technologies can help you start a company or be a great addition to your current technology portfolio. To see what technologies are currently available for licensing at Rensselaer, please use the search below. If you have a technology need that Rensselaer’s technologies don’t currently solve, please reach out to IPO to discuss more your needs.

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Currently, the most common semiconductor dielectric is silicon dioxide (SiO2), which has a dielectric constant of about 4.0. There is a substantial interest in materials with low dielectric constants that can replace SiO2-based insulators as inter layer dielectrics (ILD). This invention is directed to a new process for the preparation of low dielectric constant films. The sol-…
There is an increasing interest in using nanoparticles as building blocks for well-defined structures that have practical applications owing to the various novel properties of nanoparticles. However, their assembly is a challenging task. Methods based on surface functionalization, andor template patterning have been used for this purpose, but both of these processes can be…
This invention is directed to a highly accurate and efficient method and algorithm, namely the Dual-Bootstrap Iterative Closest Point algorithm, for performing image registration generally and retinal image registration in particular. Retinal image registration is challenging. The images are projections of a curved surface taken from a wide range of viewpoints using an un-…
Carbon nanotubes are a nanostructured material that promises to have a wide range of applications. However, the present techniques used to build nanotube architectures have several deficiencies, such as the inability to precisely and controllably align the nanotubes. This invention is a novel and powerful method to assemble carbon nanotubes on planar substrates to build and…
This invention is directed to a novel non-destructive method to remove excess layers of copper from microchip interconnect-metallization processing, allowing copper to be used in place of aluminum. The new method, an Electro-Chemical Planarization process, is a means of removing the copper in an electrolysis-designed solution bath without damaging the thin-film and…
Lookback is defined as the ability of a logical process to change its past locally (i.e. without involving other logical processes). Logical processes with lookback are able to process out-of-timestamp order events, enabling new synchronization protocols for the parallel discrete event simulation. This technology is directed to two of such protocols, LookBack-Global Virtual…
As part of the continuing effort to reduce the environmental impact of various industrial chemical processes, there has been a strong emphasis in developing new methodology for the application and cure of organic coatings. While these ubiquitous materials are absolutely essential to modern life, they also constitute one of the primary industrial Sources of emissions of…
For most types of gelatin-based imaging elements, surface abrasion and scratching results in reduction of image quality. Thus, processing the image and, later, casual handling of the image can easily mark or disfigure the image. There is, therefore, a need for an imaging element having improved scratch resistance over materials currently used. It has been unexpectedly…
Several methods for the preparation of polymeric microbeads for chromatographic separations in the pharmaceutical industry have been developed over the past several decades. However, those methods often result in microbeads with a wide distribution of sizes. This invention results in more uniform particle size but also microbeads that are derived from multifunctional epoxy…
The continued development of optical communications requires fast information processing. Therefore, ultrafast, all-optical systems and switches for basic processing at both ends of an optical transmission line are replacing electronic systems. However, there are speed and fabrication limits on present all-optical switches imposed by the properties of the materials presently…