technologies available for licensing

Rensselaer Polytechnic Institute has a variety of technologies ranging from chemicals to lighting systems to algorithms and everything in-between. Rensselaer’s technologies can help you start a company or be a great addition to your current technology portfolio. To see what technologies are currently available for licensing at Rensselaer, please use the search below. If you have a technology need that Rensselaer’s technologies don’t currently solve, please reach out to IPO to discuss more your needs.

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Isolating individual components of nanoscale architectures comprised of thin films or nanostructures, without significantly impacting their functionalities, is a critical challenge in micro- and nano-scale device fabrication. One example that illustrates this challenge is seen in Cu interconnect structures for nanometer devices. These devices use interfacial barrier nanolayers…
This invention is directed to a self-commissioning photosensor and controller device that turns electric lights on and off using a microprocessor connected to a luminaire. The processor receives signals from a self-commissioned mountable photosensor. The photosensor uses a unique algorithm to control illumination at the task pane making the photosensor more accurate than…
Most lighting level measurements are characterized in terms of illuminance.While this is useful for indoor applications, illuminance levels are not always as useful for outdoor lighting efficiency characterization.Lighting designers and researchers need a method to accurately characterize their outdoor or low level lighting applications. This invention is directed to a system…
This invention is directed to a method to improve the performance of stepper motor driven systems.Stepper motors are ubiquitous in modern office equipment and other machinery, yet little is published regarding their optimal use in open loop systems.Accurate control of a stepper motor is limited by the ability of the control system to approximate the actual motor and…
There is an increasing interest in using nanoparticles as building blocks for well-defined structures that have practical applications owing to the various novel properties of nanoparticles. However, their assembly is a challenging task. Methods based on surface functionalization, andor template patterning have been used for this purpose, but both of these processes can be…
This invention is directed to a highly accurate and efficient method and algorithm, namely the Dual-Bootstrap Iterative Closest Point algorithm, for performing image registration generally and retinal image registration in particular. Retinal image registration is challenging. The images are projections of a curved surface taken from a wide range of viewpoints using an un-…
Carbon nanotubes are a nanostructured material that promises to have a wide range of applications. However, the present techniques used to build nanotube architectures have several deficiencies, such as the inability to precisely and controllably align the nanotubes. This invention is a novel and powerful method to assemble carbon nanotubes on planar substrates to build and…
This invention is directed to a novel non-destructive method to remove excess layers of copper from microchip interconnect-metallization processing, allowing copper to be used in place of aluminum. The new method, an Electro-Chemical Planarization process, is a means of removing the copper in an electrolysis-designed solution bath without damaging the thin-film and…
Lookback is defined as the ability of a logical process to change its past locally (i.e. without involving other logical processes). Logical processes with lookback are able to process out-of-timestamp order events, enabling new synchronization protocols for the parallel discrete event simulation. This technology is directed to two of such protocols, LookBack-Global Virtual…
For most types of gelatin-based imaging elements, surface abrasion and scratching results in reduction of image quality. Thus, processing the image and, later, casual handling of the image can easily mark or disfigure the image. There is, therefore, a need for an imaging element having improved scratch resistance over materials currently used. It has been unexpectedly…